News

International Conference on Contamination/Decontamination

Annecy - 2010 september, 13th

In the frame of collaborative Project from European Commission: the so called "SPAM" project (Supra-disciplinary approach to research and training in surface Physics for Advanced Manufacturing), Adixen organizes in Annecy, on September the 13th, an Open Conference on Contamination/Decontamination thematic in semi conductor environment in the field of Advanced Lithography.

Number of participants is limited and the participation is open in priority to S.P.A.M. members and inscription is free of charge.

For more information on the conference, please contact
   catherine.leguet@adixen.fr  
   frederique.faveyrolles@adixen.fr

For more information on SPAM project, please visit web site
   http://www.euvlitho.net/internet/Folder/123125_welcome.aspx

Conclusion
This conference was organized within the frame of the so called SPAM project: European collaborative project from FP7, funded by the European Commission (Pierre et Marie Curie type project).

The topics covered in the conference were:
• Contamination issue in equipment, including ITRS recommendations
• Characterization methods and tools
• Wafer environment and photomask issues.

A large European public of more than 30 technical experts participated to the conference from various companies (STM, ASML, Hamatech, 40 30, DMS, AMTC, Toppan..) and Institutes ( Fraunhofer, IMEC, CEA , CNRS..)