Photomask in modern semiconductor fabrication undergoes intensive UV exposure that shorten the photomask lifetime because of the molecular contamination inducing haze problem for technology under 90 nm. 

Adixen is currently working on the vacuum decontamination technology for the photomask and its carrier, and the first results are showing successful results on the extension of the photomask life time. 

This permits fabs to not only reduce the mask cost but also save the mask handling and inspection time.  Two articles here describe the decontamination of the blank masks and its carrier presented in EMLC 2009 conference.